Intel Corporation D1DR Process Engineering Interview Questions

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Intel Corporation

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D1DR Process Engineering Interview

Jul 28, 2013

Anonymous employee

Accepted offer

Positive experience

Average interview

Application

I applied online. The process took 5 weeks. I interviewed at Intel Corporation (Hillsboro, OR) in Jul 2013

Interview

Applied online at intel.com/jobs - screened for Phone interview (about 1 hr: both technical questions + behavioral questions) - given an offer for on-site interview right at the end of the phone interview - scheduled for on-site within 10 days - on-site was day-long - 9 AM to 4 PM..consisted of 2:1 ( 9-10 am) with potential colleagues + 1:1 (10-11 am) with Group Leader + 45 mins PhD thesis pppt. + 15 mins questions_answers + 12-1:30 PM (lunch + ppt by Intel about benefits + overview of D1D ramp etc) + Fab Window Tour + 2-3 PM (2:1 interview: HR + technical) + 3-4 Pm (1:1 with Area Manager)...ended at about 4 PM....

Interview questions [1]

Question 1

Questions were basically from my PhD thesis: graphene devices . lithographic fabrication + etching + plasma generation 1.Describe about your research. What kind of photoresist was used? How does dry etching (RIE etch) works.. the setup. Any proble m during research and approach to solve. etcs.

2 Answers

Intel Corporation interviews Intel Corporation D1DR Process Engineering interviews Intel Corporation interview

Intel Corporation

D1DR Process Engineering Interview

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D1DR Process Engineering Interview